Peter A Heimann

Title: Innovations of Peter A Heimann

Introduction

Peter A Heimann is a notable inventor based in Clifton, NJ (US). He has made significant contributions to the field of device fabrication through his innovative patents. With a total of 2 patents, his work focuses on improving the accuracy and reliability of various technological processes.

Latest Patents

One of Heimann's latest patents is titled "Interferometric methods and apparatus for device fabrication." This invention introduces new etch monitoring and thickness measurement techniques that surpass previous methods in accuracy. The technique involves impinging a substrate region undergoing etching with light and detecting the intensity of the reflected light. By selecting incident light that is substantially opaque to underlying or overlying substrate regions, the invention eliminates signals unrelated to etch depth or thickness.

Another significant patent is "Mask-to-wafer alignment utilizing zone plates." This invention enhances mask-to-wafer alignment in X-ray lithography by utilizing zone plate marks formed on both the mask and wafer. Heimann's discovery of variations in light spot intensity and location during alignment led to the development of a modified mask structure. This structure includes a localized blocking layer over each zone plate, allowing only a negligible portion of light to propagate into the mask-to-wafer space. Additionally, an antireflection layer reduces interference effects, improving the reliability of the alignment process.

Career Highlights

Throughout his career, Peter A Heimann has worked with several prestigious companies, including American Telephone & Telegraph Co. and AT&T Bell Laboratories. His experience in these organizations has contributed to his expertise in the field of device fabrication and innovation.

Collaborations

Heimann has collaborated with notable coworkers such as Joseph M Moran and Ronald J Schutz. Their combined efforts have further advanced the technologies in which they specialize.

Conclusion

Peter A Heimann's contributions to innovations in device fabrication are noteworthy. His patents reflect a commitment to enhancing accuracy and reliability in technological processes. His work continues to influence the field and inspire future innovations.