Periyasamy Mookkan

Title: Periyasamy Mookkan: Innovator in Photoresist Compositions

Introduction

Periyasamy Mookkan is a notable inventor based in Wilmington, DE (US). He has made significant contributions to the field of microlithography through his innovative work on photoresist compositions. His expertise in polymers has led to advancements that are crucial for the development of high-performance lithographic materials.

Latest Patents

Mookkan holds a patent for "Polymers for photoresist compositions for microlithography." This patent describes nitrile/vinyl ether-containing polymers that enhance photoresist compositions. These compositions include at least one ethylenically unsaturated compound comprised of a vinyl ether and a nitrile-containing compound, such as acrylonitrile. The combination of these components imparts high ultraviolet (UV) transparency and developability in basic media. Notably, the photoresist compositions exhibit high UV transparency, particularly at short wavelengths like 157 nm and 193 nm, making them valuable for advanced lithography applications.

Career Highlights

Mookkan is associated with E.I. DuPont de Nemours and Company, where he has been instrumental in developing innovative materials for the semiconductor industry. His work has not only contributed to the company's portfolio but has also advanced the field of microlithography.

Collaborations

Throughout his career, Mookkan has collaborated with esteemed colleagues, including Michael Fryd and Frank L. Schadt, III. These collaborations have fostered an environment of innovation and have led to the successful development of new technologies in the field.

Conclusion

Periyasamy Mookkan's contributions to the field of photoresist compositions exemplify the impact of innovative thinking in technology. His work continues to influence advancements in microlithography, showcasing the importance of research and development in this critical area.