Company Filing History:
Years Active: 2002-2016
Title: Per Klockar: Innovator in Radiation Monitoring and Image Forming Technologies
Introduction
Per Klockar is a notable inventor based in Torslanda, Sweden. He has made significant contributions to the fields of radiation monitoring and image forming technologies. With a total of 2 patents, Klockar's work reflects his commitment to innovation and technological advancement.
Latest Patents
Klockar's latest patents include a radiation meter and method, which involves a radiation monitoring device equipped with at least one radiation detector, a memory, and a controller. This device is designed to detect various types of radiation doses. The memory is configured to store accumulated measured dose values corresponding to consecutive real-time intervals. The controller continuously computes mean radiation dose values and generates signals based on comparisons with predetermined reference values.
Another significant patent is related to an image forming method and an apparatus for the same, along with a cleaning device. This invention generates an airflow in a space adjacent to the toner control member when an image is not being formed. It also creates a cleaning electric field to move toner away from the toner control member. The design includes a slit in a cylindrical and rotatable counter electrode member, with a fan connected to generate airflow.
Career Highlights
Throughout his career, Klockar has worked with various companies, including Unfors Raysafe AB. His experience in these organizations has contributed to his expertise in developing innovative technologies.
Collaborations
Klockar has collaborated with notable individuals in his field, including Katsuo Sakai and Takahiko Tokumasu. These collaborations have likely enriched his work and led to further advancements in technology.
Conclusion
Per Klockar's contributions to radiation monitoring and image forming technologies highlight his innovative spirit and dedication to advancing these fields. His patents reflect a deep understanding of the technical challenges and opportunities within these areas.