Peng Tian

Title: Innovations of Peng Tian in Plasma Processing Technology

Introduction

Peng Tian is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique electrostatic chuck, which is essential for various applications in substrate processing chambers.

Latest Patents

Peng Tian holds a patent for an "Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber." This invention includes a plate with a first side and a second side, where electrodes are embedded to facilitate efficient processing. The design incorporates a gas channel and multiple gas outlets, enhancing the functionality of the electrostatic chuck in plasma environments.

Career Highlights

Peng Tian is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing technologies that improve manufacturing processes. With a patent count of 1 patent, he continues to push the boundaries of innovation in his field.

Collaborations

Throughout his career, Peng has collaborated with notable colleagues, including Jaeyong Cho and Shahid Rauf. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Peng Tian's contributions to plasma processing technology exemplify the spirit of innovation. His patented electrostatic chuck represents a significant advancement in the field, showcasing his expertise and commitment to improving manufacturing processes.