Company Filing History:
Years Active: 1998
Title: Pawitterjit S Mangat: Innovator in Lapping and Polishing Technology
Introduction
Pawitterjit S Mangat is a notable inventor based in Madison, WI (US). He has made significant contributions to the field of microfabrication, particularly in the area of planarization techniques for photoresist and metal microstructure layers. His innovative approach has led to the development of a patented method that enhances the precision and efficiency of surface finishing processes.
Latest Patents
Mangat holds a patent for a "Lapping and polishing method and apparatus for planarizing photoresist." This invention provides a method and apparatus for effectively planarizing photoresist and/or metal microstructure layers. The process involves removing material from a workpiece through lapping using a diamond-containing lapping slurry. The lapping machine is equipped with a lapping plate made of soft metal, which features ridges of controlled height created by a diamond conditioning ring. The method allows for precise control over the shear forces applied to the surface, achieving a desired surface finish.
Career Highlights
Mangat is associated with the Wisconsin Alumni Research Foundation, where he has been instrumental in advancing research and development in microfabrication technologies. His work has not only contributed to academic knowledge but has also had practical applications in various industries.
Collaborations
Mangat has collaborated with Henry Guckel, a fellow innovator in the field. Their partnership has fostered advancements in the technology surrounding lapping and polishing methods.
Conclusion
Pawitterjit S Mangat's contributions to the field of microfabrication through his innovative lapping and polishing method highlight his role as a significant inventor. His work continues to influence the industry and pave the way for future advancements in surface finishing technologies.