Location History:
- Clifton Park, NY (US) (2015)
- Malta, NY (US) (2017)
Company Filing History:
Years Active: 2015-2017
Title: Pawitter J S Mangat: Innovator in Semiconductor Metrology
Introduction
Pawitter J S Mangat is a notable inventor based in Malta, NY (US). He has made significant contributions to the field of semiconductor metrology, holding 2 patents that showcase his innovative approach to technology.
Latest Patents
Mangat's latest patents include a method, apparatus, and system for using a free-electron laser compatible EUV beam for semiconductor wafer metrology. This invention discloses at least one method, apparatus, and system for capturing synchrotron radiation for a metrology tool. The design features a beam using a first light-emitting device that comprises a first electron path bend. The first synchrotron radiation is provided from this bend to a metrology tool configured to perform inspections using the radiation.
Another significant patent involves mask structures and methods of manufacturing. This patent describes a lithography mask structure that includes a substrate, at least one reflective layer over the substrate, and an absorber film stack over the reflective layer. The absorber film stack consists of multiple first film layers of a first material and at least one second film layer of a different material, interleaved with the first layers. Notably, the total thickness of the absorber film stack is less than 50 nm, and its reflectivity is less than 2% for a predefined wavelength of EUV light.
Career Highlights
Mangat is currently associated with GlobalFoundries Inc., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing metrology tools that are crucial for the semiconductor manufacturing process.
Collaborations
Mangat has collaborated with talented individuals such as Erik Robert Hosler and Suraj Kumar Patil, contributing to a dynamic work environment that fosters innovation.
Conclusion
Pawitter J S Mangat is a distinguished inventor whose work in semiconductor metrology has led to significant advancements in the field. His patents reflect a deep understanding of technology and a commitment to innovation.