Company Filing History:
Years Active: 2002
Title: Innovations by Paul Tiner in Semiconductor Technology
Introduction
Paul Tiner is an accomplished inventor based in Plano, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the formation of ultra-thin gate oxides. With a total of 2 patents to his name, Tiner's work has advanced the capabilities of field effect transistors.
Latest Patents
Tiner's latest patents include a controllable oxidation technique for the formation of high-quality ultra-thin gate oxide using carbon dioxide as the oxidizing agent. This method involves combining an oxidizing agent, such as N2O or CO, with an etching agent, like H2, and adjusting the partial pressures to controllably grow a thin oxide of approximately 12 Angstroms. Another patent focuses on a similar controllable oxidation technique for high-quality ultrathin gate oxide formation, emphasizing the innovative approach to creating effective gate oxides for transistors.
Career Highlights
Paul Tiner is currently employed at Texas Instruments Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the performance and reliability of electronic devices.
Collaborations
Tiner has collaborated with notable colleagues, including Ming J Hwang and Sunil V Hattangady, contributing to a dynamic research environment that fosters innovation.
Conclusion
Paul Tiner's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced electronic components.