Paul R Kube

Title: Innovations of Paul R Kube in Photolithography

Introduction

Paul R Kube is an accomplished inventor based in San Diego, CA. He has made significant contributions to the field of photolithography, particularly through his innovative patent that enhances image simulation techniques. His work is vital for advancements in semiconductor manufacturing and related technologies.

Latest Patents

Paul R Kube holds a patent titled "Fast image simulation for photolithography." This patent describes a fast method that simulates photolithography using conventional image processing techniques. The process involves convolution to simulate blurring, while erosion and dilation are used to correct for edge diffraction. In one technique, the source image of the photomask is deconvolved to sharpen it and then dilated to remove edge diffraction. The image is subsequently eroded and convolved according to the resolution of the stepper at the photomask plane. This aerial image can be further eroded to match the effects of resist and developing. Optional thresholding is performed to produce a simulated processed wafer image. In a faster technique, the deconvolution step is eliminated, and dilation and erosion are combined into a single erosion. When a phase shift mask is involved, a complex convolution is utilized. The source data can originate from the photomask electronic design or from a visual image of the actual photomask. Optimizations include special microprocessor instructions, floating point pixel values, separable convolution, and annular illumination simulation. He has 1 patent to his name.

Career Highlights

Throughout his career, Paul R Kube has demonstrated a commitment to innovation in the field of photolithography. His work has not only advanced the technology but has also contributed to the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Paul has collaborated with notable professionals in his field, including Peter J Fiekowsky and April Dutta. Their combined expertise has likely fostered a productive environment for innovation and development.

Conclusion

Paul R Kube's contributions to photolithography through his innovative patent highlight his role as a significant inventor in the field. His work continues to influence advancements in technology and manufacturing processes.