Paul N Chaloux, Jr

Title: Paul N Chaloux, Jr: Innovator in Semiconductor Technology

Introduction

Paul N Chaloux, Jr. is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to interconnection levels and polymerization processes.

Latest Patents

One of Chaloux's latest patents is titled "Method for simultaneously forming an interconnection level and via studs." This method involves creating a level of interconnection metallurgy over an insulating layer of a semiconductor chip. The process includes forming via holes in the insulating layer, high-mobility sputtering of conductive material, masking the conductive layer, and ion beam milling to create a patterned interconnection layer. The high-mobility sputtering is achieved by maintaining specific conditions, such as reducing background pressure and controlling chip temperature, which allows for a dense interconnection level without void formation.

Another significant patent is "Underlay surface modification to control resin glass polymerization." This invention addresses the challenges posed by uneven distribution of resin glass during polymerization, which can lead to difficulties in subsequent processing. By treating the underlay surface with a short plasma treatment, the polymerization is controlled to occur in a two-dimensional mode, thus eliminating uneven distribution and its associated issues.

Career Highlights

Chaloux is currently employed at International Business Machines Corporation (IBM), where he continues to develop innovative solutions in semiconductor technology. His work has contributed to advancements in the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Chaloux has collaborated with esteemed colleagues, including Thomas F Houghton and Richard K West. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies.

Conclusion

Paul N Chaloux, Jr. is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His innovative patents reflect his commitment to improving manufacturing processes and addressing challenges in the industry.