Paul K Boyer

Title: Paul K Boyer: Innovator in Microelectronic Thin Film Technology

Introduction

Paul K Boyer is a notable inventor based in Ft. Collins, CO (US). He has made significant contributions to the field of microelectronics, particularly through his innovative patent related to electron beam induced chemical vapor deposition. His work has implications for the development of advanced microelectronic devices.

Latest Patents

Paul K Boyer holds a patent for a new low-temperature method (50°C to 500°C) to deposit and grow microelectronic thin films. This method utilizes cold cathode electron beams to initiate and sustain both gas phase and surface chemical reactions. The patent describes how electron beams generated by glow discharge electron guns can decompose reactant molecules directly by electron impact and indirectly through vacuum ultraviolet radiation. This innovative approach allows for the spatial confinement of electron beams, which excites only a localized region above the substrate, thereby avoiding direct plasma bombardment.

Career Highlights

Boyer's career is marked by his work at Colromm, Inc., where he has been instrumental in advancing microelectronic film technology. His patent enables the deposition of various microelectronic films, including insulators, conductors, and semiconductors. The method also facilitates the growth of native films such as oxides and nitrides through electron beam-assisted decomposition of gas molecule reactants.

Collaborations

Paul K Boyer has collaborated with notable colleagues, including George J Collins and Lance R Thompson. Their combined expertise has contributed to the successful development of innovative technologies in the field of microelectronics.

Conclusion

Paul K Boyer's contributions to microelectronic thin film technology through his patented methods highlight his role as a significant inventor in this field. His work continues to influence advancements in microelectronics and related applications.