Paul E Gee

Title: Paul E Gee: Innovator in Semiconductor Processing

Introduction

Paul E Gee is a notable inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent related to isotropic silicon nitride removal. His work is essential in advancing technologies that rely on precise material etching.

Latest Patents

Paul E Gee holds a patent for "Isotropic silicon nitride removal." This patent describes exemplary methods of etching a silicon-containing material, which includes flowing a first fluorine-containing precursor and a sulfur-containing precursor into a remote plasma region of a semiconductor processing chamber. The methods involve forming a plasma to generate plasma effluents and flowing these effluents into a processing region where a substrate is positioned. The substrate features a trench formed through stacked layers of silicon nitride and silicon oxide, allowing for isotropic etching of the silicon nitride layers while maintaining the integrity of the silicon oxide.

Career Highlights

Paul E Gee is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His expertise in semiconductor processing has positioned him as a valuable asset to the company. With a focus on innovative etching methods, he continues to contribute to advancements in the field.

Collaborations

Throughout his career, Paul has collaborated with talented individuals such as Mikhail Korolik and Wei Ying Doreen Yong. These collaborations have fostered an environment of innovation and have led to significant advancements in semiconductor processing techniques.

Conclusion

Paul E Gee's contributions to semiconductor processing through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work continues to influence the industry and pave the way for future innovations.