Paul C Waldrop

Title: Paul C Waldrop: Innovator in Fabrication Techniques

Introduction

Paul C Waldrop is a notable inventor based in Ithaca, NY (US). He holds a total of 10 patents that showcase his contributions to the field of fabrication techniques, particularly in the development of integrated devices.

Latest Patents

Waldrop's latest patents include a method for fabricating an ESI device using SMILE and delayed LOCOS techniques. This invention discloses three fundamental aspects that can be integrated into a full process. The first aspect, known as 'latent masking', defines a mask in a persistent material like silicon oxide, which is held abeyant while other processing operations are performed. The second aspect, 'simultaneous multi-level etching (SMILE)', allows for a first pattern to be etched deeper, shallower, or to the same depth as a second pattern. The third aspect, 'delayed LOCOS', enables the definition of a contact hole pattern at one stage, which can be used later to open the contact holes. These innovations provide increased manufacturing yield and design latitude compared to previously disclosed methods.

Career Highlights

Throughout his career, Waldrop has made significant advancements in the field of fabrication techniques. His work has led to improved processes that enhance the efficiency and effectiveness of manufacturing integrated devices.

Collaborations

Waldrop has collaborated with notable individuals such as James E Moon and Timothy J Davis, contributing to the advancement of technology in his field.

Conclusion

Paul C Waldrop's innovative work in fabrication techniques has made a lasting impact on the industry. His patents reflect a commitment to improving manufacturing processes and device integration.