Patrick Speno

Title: The Innovations of Patrick Speno

Introduction

Patrick Speno is an accomplished inventor based in Hopewell Junction, NY (US). He holds a patent that showcases his expertise in the field of photolithography. His work has contributed significantly to the advancement of printed features on substrates.

Latest Patents

Patrick Speno's notable patent is titled "Critical dimension control of printed features using non-printing fill patterns." This innovation addresses the challenges of non-uniformity and image shortening in printed images. The patent describes a method that utilizes a photolithographic mask with a specific pattern to enhance the quality of printed images. By incorporating line features within clear regions of the mask pattern, the invention allows for improved precision in printing, even at resolutions smaller than the optical projection system's minimum capability.

Career Highlights

Throughout his career, Patrick has worked with prominent companies such as Infineon Technologies AG and International Business Machines Corporation (IBM). His experience in these organizations has provided him with a solid foundation in technology and innovation.

Collaborations

Patrick has collaborated with notable professionals in his field, including Chung-Hsi J Wu and Timothy A Brunner. These partnerships have likely contributed to the development and refinement of his innovative ideas.

Conclusion

Patrick Speno's contributions to the field of photolithography through his patent demonstrate his commitment to innovation and excellence. His work continues to influence the industry and inspire future advancements.