This inventor holds 2 USPTO granted patents. Top assignees: Agfa Corporation, Agfa Division, Bayer Corporation. Active years: 1998-2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998-2000
Title: The Innovative Contributions of Patrick Pandelaers
Introduction
Patrick Pandelaers is a notable inventor based in Andover, MA (US). He has made significant contributions to the field of imaging systems and scanning technologies. With a total of 2 patents, his work showcases a blend of creativity and technical expertise.
Latest Patents
One of Patrick's latest patents is titled "Registration apparatus and method for imaging at variable resolutions." This invention involves an imaging system and method for registering multiple fractionally shifted integrated scenes of an image. The system utilizes an optical system and a sensing system, which includes an integer number of photosensor arrays, such as a CCD sensor array. Each photosensor array can be independently triggered to convert optical signals into electrical signals, enhancing the imaging process.
Another significant patent is the "Combined dust protection and dark calibration slide for a flat-bed." This scanning apparatus provides separate fixed object focal planes for transmissive and reflective original documents. The movable scan carriage contains illumination, sensor, and optical elements, allowing for efficient scanning and digitization of documents. The dark slide feature protects against flare during scanning and facilitates dark current calibration.
Career Highlights
Throughout his career, Patrick has worked with several prominent companies, including Agfa Division, Bayer Corporation, and Agfa Corporation. His experience in these organizations has contributed to his development as an inventor and innovator in the imaging technology sector.
Collaborations
Patrick has collaborated with notable individuals in his field, including John F. Omvik and Joseph A. Wheeler. These collaborations have likely enriched his work and led to further advancements in his inventions.
Conclusion
Patrick Pandelaers is a distinguished inventor whose contributions to imaging systems and scanning technologies have made a lasting impact. His innovative patents reflect his dedication to advancing technology in these fields.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile