Location History:
- Milpitas, CA (US) (2004 - 2005)
- Sunnyvale, CA (US) (2005)
Company Filing History:
Years Active: 2004-2005
Title: Innovations by Patrick P.H. Wu: A Pioneer in CMP Technologies
Introduction
Patrick P.H. Wu, an esteemed inventor based in Milpitas, California, has made significant contributions to the field of chemical mechanical planarization (CMP). With a total of four patents to his name, his work focuses on methods and systems that enhance the precision and efficiency of CMP processes. Wu's inventions reflect his dedication to advancing technology in semiconductor manufacturing.
Latest Patents
Patrick Wu's latest innovations include two noteworthy patents. The first patent describes "Methods and systems for controlling belt surface temperature and slurry temperature in linear chemical mechanical planarization." This system features a belt pad, a slurry bar equipped with multiple nozzles, and an innovative heating module designed to maintain optimal temperature control. It incorporates a variety of heating elements and temperature sensors to ensure the efficient heating of the slurry and belt pad surface.
The second patent, titled "Liquid dispense manifold for chemical-mechanical polisher," showcases a liquid dispense manifold engineered with drip nozzles that form controlled droplets. The design ensures an even flow rate of uniform drops onto the polishing surface, thereby improving the CMP process's effectiveness. These patents exemplify Wu’s commitment to creating practical solutions that address challenges faced in semiconductor manufacturing.
Career Highlights
Patrick Wu currently contributes his expertise at Lam Research Corporation, a reputable leader in the semiconductor equipment industry. His role at Lam Research has allowed him to collaborate with some of the brightest minds in the field, driving innovations that uphold the company's reputation for quality and pioneering technology.
Collaborations
Throughout his career, Wu has worked alongside notable colleagues including Xuyen Pham and Cangshan Xu. These collaborative efforts highlight the teamwork and synergy in the research and development of advanced CMP technologies.
Conclusion
Patrick P.H. Wu is a dedicated inventor whose work significantly impacts the semiconductor industry. His four patents reflect his innovative spirit and commitment to advancing CMP processes. By continually pushing the boundaries of technology, Wu exemplifies the role of inventors in shaping the future of manufacturing solutions.