Patrick N Everett

Title: **The Innovative Mind of Patrick N Everett**

Introduction

Patrick N Everett, an accomplished inventor based in Concord, MA, is known for his significant contributions to the field of lithography. With a total of 9 patents to his name, Everett has pioneered methods that enhance precision and reliability in optical measurements and lithography processes.

Latest Patents

Among his latest patents is the groundbreaking invention titled "Method and system for interference lithography utilizing phase-locked scanning beams." This invention revolutionizes interference lithography by employing phase-locked, scanning beams. The method features a high-precision stage that moves a substrate underneath overlapping coherent beams, generating interference fringes that form patterns for writing on various substrates. The patent outlines advanced techniques for measuring and controlling the effects of mechanical and thermal drift during the writing process.

Another notable patent is the "Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction." This apparatus effectively measures the gap between a mask and substrate, utilizing a novel design of the grating mark to achieve high sensitivity and accuracy. The invention incorporates a diffractive Michelson technique for direct calibration, employing a linear grating within the gapping mark to enhance measurement precision.

Career Highlights

Patrick N Everett has collaborated with prestigious organizations during his career, including the Massachusetts Institute of Technology and Jersey Nuclear-Avco Isotopes, Inc. His work has significantly influenced the fields intersecting engineering and technology, particularly in developing methods and systems that enhance optical measurement accuracy.

Collaborations

Throughout his career, Everett has worked alongside notable colleagues such as Euclid E Moon and Henry Ignatius Smith. Their collective expertise has led to innovations that further the understanding and capabilities of lithographic technologies.

Conclusion

Patrick N Everett's contributions to innovations in interference lithography and optical measurements have established him as a prominent inventor in his field. With a commitment to enhancing precision and reliability, his work continues to influence technology and engineering practices today.