Company Filing History:
Years Active: 2002-2004
Title: Patrick James French: Innovator in Electrochemical Etching
Introduction
Patrick James French is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of electrochemical etching, holding 2 patents that showcase his innovative approaches to silicon device manufacturing.
Latest Patents
One of his latest patents is titled "Method and apparatus for radiation assisted electrochemical etching and etched product." This patent describes an electrochemical etching system that includes an etching bath for holding an n-type silicon substrate. The system features an electrode positioned in hydrofluoric acid, a power source, and an illumination unit that enhances the etching process. The illumination unit is designed to illuminate the second surface of the silicon substrate with a specific intensity, allowing for the formation of pores and trenches of precise sizes and shapes across a large area of the substrate.
Another significant patent is the "Manufacturing method of silicon device." This patent outlines a method for creating a silicon device with a single crystal structure. The process involves forming etching start patterns on a silicon substrate and applying a voltage while the substrate is immersed in a fluorine ion solution. This innovative method accelerates the etching process, resulting in a free-standing structure that includes part of the silicon substrate.
Career Highlights
Patrick is currently employed at Mitsubishi Denki Kabushiki Kaisha, where he continues to develop cutting-edge technologies in the field of silicon devices. His work has been instrumental in advancing the capabilities of electrochemical etching systems.
Collaborations
Throughout his career, Patrick has collaborated with esteemed colleagues such as Hiroshi Ohji and Kazuhiko Tsutsumi. These collaborations have further enriched his research and development efforts.
Conclusion
Patrick James French is a distinguished inventor whose work in electrochemical etching has paved the way for advancements in silicon device manufacturing. His innovative patents reflect his commitment to pushing the boundaries of technology in this field.