Company Filing History:
9 out of 3,024 
2 out of 29,279 
Years Active: 2010-2025
Title: The Innovative Contributions of Patrick David Noll
Introduction
Patrick David Noll is a prominent inventor based in Richardson, Texas. He has made significant contributions to the field of integrated circuit fabrication, holding a total of 11 patents. His work focuses on enhancing the efficiency and accuracy of semiconductor manufacturing processes.
Latest Patents
Among his latest patents is the "Inline Wafer Defect Detection System and Method." This invention involves a wafer defect detection apparatus that captures images of semiconductor wafers during a targeted process step. The method preprocesses these images to identify a reference wafer image, allowing for enhanced defect detection through an ensemble of image analysis techniques. Another notable patent is the "Run-to-Run Control for Chemical Mechanical Planarization." This method provides a partitioned chemical-mechanical planarization model that includes device-specific parameters and common parameters, enabling automatic determination of polish time for integrated circuit fabrication.
Career Highlights
Patrick has worked with notable companies such as Rockwell Automation Technologies Incorporated and Texas Instruments Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Throughout his career, Patrick has collaborated with talented individuals, including Maina A Macharia and James F Bartee. These collaborations have further enriched his work and contributed to advancements in the field.
Conclusion
Patrick David Noll's innovative patents and career achievements highlight his significant impact on the semiconductor industry. His contributions continue to shape the future of integrated circuit fabrication.