San Diego, CA, United States of America

Partiv S Patel


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2007

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Partiv S Patel: Innovator in Gas Discharge Laser Technology

Introduction

Partiv S Patel is a notable inventor based in San Diego, California. He has made significant contributions to the field of laser technology, particularly in the development of gas discharge laser systems. His innovative work has led to the creation of a unique apparatus that enhances the crystallization process in various substrates.

Latest Patents

Partiv S Patel holds a patent for a "Very high energy, high stability gas discharge laser surface treatment system." This invention includes a gas discharge laser crystallization apparatus designed to transform the crystal makeup or orientation in the substrate of a workpiece. The system features a multichamber laser setup, which includes a first laser unit with two gas discharge chambers. Each chamber contains a pair of elongated, spaced-apart opposing electrodes that create a gas discharge region. The apparatus utilizes a specific laser gas mixture to optimize the crystallization process, along with a sophisticated power supply module and a laser timing and control module to ensure precise operation.

Career Highlights

Partiv S Patel has demonstrated exceptional expertise in the field of laser technology through his innovative designs and patents. His work has not only advanced the understanding of gas discharge lasers but has also provided practical applications in various industries. He is currently associated with Tcz Pte. Ltd., where he continues to develop cutting-edge technologies.

Collaborations

Partiv has collaborated with notable professionals in his field, including Palash P Das and Bruce E Bolliger. These collaborations have further enriched his work and contributed to the advancement of laser technology.

Conclusion

Partiv S Patel is a distinguished inventor whose contributions to gas discharge laser technology have made a significant impact. His innovative patent showcases his commitment to advancing the field and improving crystallization processes in various applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…