Company Filing History:
Years Active: 2009
Title: Paritosh C Panchal: Innovator in Disk Drive Technology
Introduction
Paritosh C Panchal is a notable inventor based in Hutchinson, MN, who has made significant contributions to the field of disk drive technology. His innovative work has led to the development of a unique patent that enhances the functionality of disk drive suspension systems.
Latest Patents
Panchal holds a patent for "Dual sided electrical traces for disk drive suspension flexures." This invention involves a flexure designed for attachment to a load beam in an integrated lead disk drive suspension assembly. The flexure features a spring metal layer with a slider mounting region, a first surface, and a second surface opposing the first surface. A first group of conductive leads extends along at least a portion of the first surface, separated from the spring metal layer by a first dielectric layer. Similarly, a second group of conductive leads extends along at least a portion of the second surface, separated by a second dielectric layer. Additionally, a conductive interconnection links a conductive lead from the first group to a conductive lead from the second group. This design allows for one or more leads from each group to be attached to a magnetic head, enhancing the overall performance of disk drives.
Career Highlights
Panchal is currently employed at Hutchinson Technology Corporation, where he continues to innovate and contribute to advancements in technology. His work has been instrumental in improving the efficiency and reliability of disk drive systems.
Collaborations
Throughout his career, Panchal has collaborated with talented individuals such as Ryan Kariniemi and Reed T Hentges. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Paritosh C Panchal is a distinguished inventor whose work in disk drive technology has made a lasting impact. His patent for dual-sided electrical traces exemplifies his commitment to innovation and excellence in engineering.