Palo Alto, CA, United States of America

Parce J Wallace


Average Co-Inventor Count = 10.0

ph-index = 2

Forward Citations = 143(Granted Patents)


Company Filing History:


Years Active: 2006-2007

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2 patents (USPTO):Explore Patents

Sure, I can assist you with that. Here is the article about inventor Parce J Wallace:

Title: Innovator Spotlight: Parce J Wallace - Revolutionizing Macroelectronic Substrates

Introduction:

Parce J Wallace, a brilliant inventor based in Palo Alto, CA, is making waves in the world of technology with his groundbreaking innovations. With a keen focus on large-area nanoenabled macroelectronic substrates, Wallace is at the forefront of cutting-edge semiconductor device development.

Latest Patents:

Wallace's latest patents include "Large-area nanoenabled macroelectronic substrates and uses therefor," a method and apparatus for electronic substrates with a multitude of semiconductor devices. This patent involves the formation of a thin film of nanowires on a substrate, designed for optimal operational current levels and electrical connectivity. The patent also explores various materials and techniques for enhancing nanowire functionality.

Career Highlights:

Currently employed at Nanosys, Inc., Wallace showcases his expertise in developing advanced semiconductor technologies. With a portfolio of 2 patents, his contributions are shaping the future of macroelectronic substrates. His dedication to pushing the boundaries of innovation is truly commendable.

Collaborations:

Alongside his colleagues Xiangfeng Duan and Chunming Niu, Wallace synergizes his inventive prowess with the expertise of fellow innovators at Nanosys, Inc. Their collaborative efforts have led to the successful development of cutting-edge technologies that have the potential to revolutionize the electronics industry.

Conclusion:

Inventor Parce J Wallace is a visionary in the field of semiconductor devices, paving the way for transformative advancements in large-area nanoenabled macroelectronic substrates. His ingenuity, coupled with a passion for innovation, underscores his significant contributions to the realm of technological progress.

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