Helsinki, Finland

Panu Y Jalas


Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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2 patents (USPTO):Explore Patents

Title: **Panu Y. Jalas: Innovator in Semiconductor Technology**

Introduction

Panu Y. Jalas is a distinguished inventor based in Helsinki, Finland, known for his significant contributions to the field of semiconductor technology. With two patents to his name, Jalas has demonstrated his expertise and innovative spirit in the development of methods for forming contacts on semiconductor substrates, particularly for radiation detectors and imaging devices.

Latest Patents

Among Jalas's latest patents, one highlights a method suitable for forming metal contacts on semiconductor substrates. This method involves several steps, including forming one or more layers of material on the substrate's surface with openings at the designated contact positions. A layer of metal is then formed over these layers and openings, followed by the removal of the excess metal to create individual contacts. A passivation layer may be applied between these contacts to enhance functionality. Additionally, care is taken to ensure that etchants used for removing unwanted metal do not come into contact with the substrate surface, thus preserving its resistive properties.

Career Highlights

Panu Y. Jalas has established himself within the technology sector, particularly at Simage Oy, where he applies his knowledge to advance semiconductor technology. His work is characterized by a focus on practical applications that enhance the effectiveness of radiation detectors and imaging devices.

Collaborations

During his career, Jalas has collaborated with notable professionals, including Risto O. Orava and Tom Gunnar Schulman. Together, they have worked towards innovations that advance the field of semiconductor research and applications, contributing to the efficacy and reliability of radiation detection technologies.

Conclusion

Panu Y. Jalas is a noteworthy inventor whose contributions to semiconductor technology reflect a commitment to innovation and excellence. His patents underscore the importance of developing efficient methods for metal contact formation, which play a crucial role in enhancing the performance of radiation detectors and imaging devices. As his career progresses, Jalas continues to influence the semiconductor industry through his innovative approaches and collaborations.

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