Company Filing History:
Years Active: 2018-2019
Title: The Innovations of Padraig Timoney
Introduction
Padraig Timoney is a notable inventor based in Malta, NY (US). He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, his work focuses on advanced methodologies for measuring dielectric thickness in semiconductor devices.
Latest Patents
Timoney's latest patents include innovative methodologies and apparatuses for enabling three-dimensional scatterometry. This technology is designed to measure the thickness of dielectric layers in semiconductor devices. The process involves initiating optical critical dimension (OCD) scatterometry on a three-dimensional test structure formed on a wafer. This test structure comprises patterned copper (Cu) trenches with an ultra-low k (ULK) dielectric film formed over them. A processor then obtains the thickness of the ULK dielectric film based on the results of the OCD scatterometry.
Career Highlights
Padraig Timoney is currently employed at GlobalFoundries Inc., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the precision of measurements in the semiconductor manufacturing process.
Collaborations
Timoney collaborates with Alok Vaid, a fellow innovator in the field. Their combined expertise contributes to the advancement of semiconductor technologies.
Conclusion
Padraig Timoney's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of more efficient measurement techniques in semiconductor devices.