Company Filing History:
Years Active: 2009
Title: Pablo Acuna-Vazquez: Innovator in Impact-Resistant Thermoplastic Materials
Introduction
Pablo Acuna-Vazquez is a notable inventor based in Saltillo, Mexico. He has made significant contributions to the field of materials science, particularly in the development of impact-resistant thermoplastic materials. His innovative work has implications for various industries that require durable and resilient materials.
Latest Patents
Acuna-Vazquez holds a patent for the "Preparation of impact-resistant thermoplastic materials on the basis of styrene/butadiene copolymers with polydisperse blocks." This invention describes the obtainment of impact-resistant materials from a block copolymer that comprises as monomers an alkadiene and a vinyl aromatic compound. The copolymer serves as an impact modifier, allowing for the creation of materials with enhanced impact resistance. The invention enables the production of various morphologies, such as rods, points, or capsules, by incorporating the copolymer into a polymeric matrix derived from vinyl aromatic monomers. This innovative approach achieves increases in impact values of up to 50% through the use of the copolymer.
Career Highlights
Pablo Acuna-Vazquez is currently employed at Dynasol Elastomeros, S.A. de C.V., where he continues to advance his research and development efforts. His work at Dynasol has positioned him as a key player in the field of elastomers and thermoplastic materials.
Collaborations
Throughout his career, Acuna-Vazquez has collaborated with talented individuals such as Graciela Morales-Balado and Rodolfo Flores-Flores. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Pablo Acuna-Vazquez is a distinguished inventor whose work in impact-resistant thermoplastic materials has made a significant impact on the industry. His innovative patent and ongoing contributions at Dynasol Elastomeros highlight his commitment to advancing materials science.