Owen A Heng

Title: Owen A Heng: Innovator in Chemical Processes

Introduction

Owen A Heng is a notable inventor based in Midland, MI (US). He has made significant contributions to the field of chemical engineering, particularly in processes that involve the treatment of gaseous vent streams and the separation of particulate silicon.

Latest Patents

Owen A Heng holds 2 patents that showcase his innovative approaches. His latest patents include a process for the treatment of vent gas to remove hydrogen chloride. This process involves contacting a gaseous vent gas containing hydrogen chloride and a hydrosilane with a chlorination catalyst. The result is a more chlorinated silane, which captures chlorine from the hydrogen chloride, providing a readily condensable chlorosilane. Another patent focuses on the separation of particulate silicon from a liquid by-product stream containing silanes. This process atomizes the liquid by-product stream into a heated zone, allowing for the vaporization of liquid silanes and the drying of particulate silicon. The dried particulate silicon can then be separated from the gaseous silanes through filtration or other suitable means.

Career Highlights

Owen A Heng is currently employed at Hemlock Semiconductor Corporation, where he applies his expertise in chemical processes. His work has contributed to advancements in the semiconductor industry, particularly in the efficient handling of chemical by-products.

Collaborations

Owen has collaborated with notable coworkers such as Richard A Burgie and Tod E Lange. Their combined efforts have fostered innovation and development within their field.

Conclusion

Owen A Heng's contributions to chemical engineering through his patents and work at Hemlock Semiconductor Corporation highlight his role as an influential inventor. His innovative processes continue to impact the industry positively.