Company Filing History:
Years Active: 1976
Title: Oskar Riester: Innovator in Photographic Materials
Introduction
Oskar Riester is a notable inventor based in Leverkusen, Germany. He has made significant contributions to the field of photographic materials, holding a total of 2 patents. His work focuses on enhancing the quality and functionality of photographic products.
Latest Patents
Riester's latest patents include innovative solutions for photographic materials. One of his patents addresses antihalation and filter dyes, specifically designed for photographic materials. These dyes, which include mono-, tri-, or pentamethineoxonoles of 1-sulfolanyl pyrazolones, can be easily decolorized and washed out during photographic processing. Another patent involves light-sensitive photographic material that contains supersensitized silver halide emulsions. This sensitization is improved by the addition of heterocyclically substituted thioureas, enhancing the overall performance of the photographic materials.
Career Highlights
Oskar Riester has had a distinguished career, primarily working with Agfa-Gevaert AG. His expertise in photographic technology has led to advancements that benefit both the industry and consumers. His innovative approaches have set new standards in photographic material development.
Collaborations
Throughout his career, Riester has collaborated with esteemed colleagues such as Hans Ohlschlager and Franz Moll. These partnerships have fostered a creative environment that has led to groundbreaking advancements in photographic technology.
Conclusion
Oskar Riester's contributions to the field of photographic materials demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in photographic technology, making him a significant figure in this industry.