Shunan, Japan

Osamu Tanaka

USPTO Granted Patents = 3 


Average Co-Inventor Count = 3.8

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: The Innovations of Osamu Tanaka

Introduction

Osamu Tanaka is a notable inventor based in Shunan, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced silica products. With a total of 3 patents to his name, Tanaka's work has garnered attention for its innovative approaches and practical applications.

Latest Patents

Tanaka's latest patents include a surface-treated sol-gel silica and a method for producing the same. This innovative sol-gel silica is characterized by containing sol-gel silica with an average particle size of 0.05 μm to 2.0 μm, along with a surface treatment agent. In a dispersion created by dispersing 5 mass % of the sol-gel silica in ethanol using ultrasonic waves, the content of larger particles is minimized to 10 ppm or less. Another significant patent involves an amorphous silica-titania composite oxide powder, which is untreated with a surface treatment agent. This powder exhibits specific properties, such as a refractive index of not less than 1.46 and a controlled water absorption rate, making it suitable for various applications.

Career Highlights

Osamu Tanaka is currently employed at Tokuyama Corporation, where he continues to innovate and develop new materials. His work has been instrumental in advancing the company's product offerings and enhancing their technological capabilities.

Collaborations

Tanaka collaborates with esteemed colleagues, including Hiromasa Fujioka and Hiroaki Taira. Their combined expertise contributes to the success of their projects and the advancement of their research.

Conclusion

Osamu Tanaka's contributions to the field of materials science through his innovative patents and collaborations highlight his role as a leading inventor. His work continues to influence the industry and pave the way for future advancements.

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