Location History:
- Ibaraki, JP (2012 - 2014)
- Koga, JP (2014)
Company Filing History:
Years Active: 2012-2014
Title: Osamu Nakamura: Innovator in Polymer Technology
Introduction
Osamu Nakamura is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of polymer technology, particularly in the development of gas barrier films and modified vinyl alcohol polymers. With a total of 3 patents to his name, Nakamura's work has implications for various industries, including packaging and materials science.
Latest Patents
Nakamura's latest patents include a method for producing unsaturated carboxylic acid-modified vinyl alcohol polymer and a gas barrier film or gas barrier laminate using the same. The first patent describes a method characterized by the reaction of a vinyl alcohol polymer and an unsaturated carboxylic acid compound in the presence of an acid catalyst. This innovative approach allows for the production of a solution containing the modified polymer. The second patent focuses on a gas-barrier film that comprises a polymer of a polyvalent metal salt of an unsaturated carboxylic acid compound. This film is notable for its specific infrared absorption spectrum, which is crucial for its gas barrier properties.
Career Highlights
Throughout his career, Osamu Nakamura has worked with prominent companies such as Tohcello Co., Ltd. and Mitsui Chemicals, Inc. His experience in these organizations has allowed him to refine his expertise in polymer chemistry and develop innovative solutions that address industry needs.
Collaborations
Nakamura has collaborated with esteemed colleagues, including Tomoyoshi Hakamata and Akira Nomoto. These partnerships have fostered a creative environment that has led to advancements in their respective fields.
Conclusion
Osamu Nakamura's contributions to polymer technology and his innovative patents highlight his role as a significant inventor in the industry. His work continues to influence advancements in materials science and engineering.