Company Filing History:
Years Active: 2019
Title: Osamu Honma: Innovator in Silica Glass Technology
Introduction
Osamu Honma is a notable inventor based in Chiyoda-ku, Japan. He has made significant contributions to the field of optical materials, particularly in the development of low scattering silica glass. His innovative work has implications for the advancement of optical communication technologies.
Latest Patents
Honma holds a patent for "Low scattering silica glass and method for heat-treating silica glass." This invention provides low scattering silica glass that is suitable as a material for optical communication fibers. The silica glass has a fictive temperature of at least 1,000°C and a void radius of at most 0.240 nm, as measured by positron annihilation lifetime spectroscopy. The patent also details a method for heat-treating silica glass, which involves holding the glass in an atmosphere at a temperature between 1,200°C and 2,000°C under a pressure of at least 30 MPa. The cooling process is critical, requiring an average temperature-decreasing rate of at least 40°C/min during cooling within the temperature range of 1,200°C to 900°C.
Career Highlights
Osamu Honma is associated with AGC Inc., a leading company in glass and materials technology. His work at AGC Inc. has allowed him to focus on innovative solutions in silica glass, contributing to advancements in optical communication.
Collaborations
Honma has collaborated with notable colleagues, including Madoka Ono and Setsuro Ito. Their combined expertise has fostered a productive environment for innovation in their field.
Conclusion
Osamu Honma's contributions to silica glass technology exemplify the importance of innovation in optical materials. His patent for low scattering silica glass is a testament to his expertise and commitment to advancing communication technologies.