Odawara, Japan

Osama Uchida

This inventor holds 1 USPTO granted patent. Top assignee: Fujifilm Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osama Uchida. Retrieved from https://idiyas.com/inventor/osama-uchida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Osama Uchida: Innovator in Near-Infrared Technology

Introduction

Osama Uchida is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of materials science, particularly in the development of near-infrared-absorbing materials. His work is essential for various applications, including optical filters and imaging technologies.

Latest Patents

Uchida holds a patent for a near-infrared-absorbing material and a near-infrared-absorbing filter. This invention provides a near-infrared-absorbing material comprising at least one first compound selected from the group consisting of a singlet oxygen scavenger, a radical trapping agent, and an antioxidant, along with at least one second compound represented by specific chemical formulas. This innovation is crucial for enhancing the performance of optical devices.

Career Highlights

Osama Uchida is associated with Fujifilm Corporation, a leading company in imaging and information technology. His role at Fujifilm has allowed him to work on cutting-edge technologies that push the boundaries of material science. His expertise has contributed to the company's reputation for innovation and quality.

Collaborations

Uchida has collaborated with notable colleagues, including Keizo Kimura and Katsuyoshi Yamakawa. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Osama Uchida's work in developing near-infrared-absorbing materials showcases his innovative spirit and dedication to advancing technology. His contributions are vital for the future of optical applications and materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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