Company Filing History:
Years Active: 2022
Title: Ophelie Isabelle Berthuy: Innovator in Single Particle Deposition Technology
Introduction
Ophelie Isabelle Berthuy is a notable inventor based in Diemoz, France. She has made significant contributions to the field of particle deposition technology, particularly through her innovative methods and apparatuses. Her work focuses on enhancing the efficiency and effectiveness of single particle deposition, which has important applications in various scientific and industrial fields.
Latest Patents
Ophelie holds a patent for a "Method and apparatus for single particle deposition." This invention involves a droplet dispenser designed to deposit single particles onto a target. The method improves the rate of dispensing single particles while increasing the recovery of rare particles. It also extends applicability across different types of particles and operational conditions. The technology allows for the simultaneous testing of single particle conditions alongside zero particle conditions, enhancing the overall efficiency of the deposition process.
Career Highlights
Ophelie is currently associated with Scienion GmbH, where she continues to develop her innovative technologies. Her work has garnered attention for its potential to revolutionize how single particles are handled in various applications. With a focus on improving dispensing rates without compromising recovery, her contributions are paving the way for advancements in particle technology.
Collaborations
Ophelie collaborates with esteemed colleagues such as Guilhem Arnaud Tourniaire and Francois Monjaret. Their combined expertise fosters a dynamic environment for innovation and research, further enhancing the impact of their work in the field.
Conclusion
Ophelie Isabelle Berthuy is a pioneering inventor whose work in single particle deposition technology is making waves in the scientific community. Her innovative methods and collaborative spirit are set to drive future advancements in this critical area of research.