Company Filing History:
1 out of 25 
1 out of 1 Years Active: 2024
Title: Oliver Schlosser: Innovator in EUV Light Source Technology
Introduction
Oliver Schlosser is a prominent inventor based in Filderstadt, Germany. He has made significant contributions to the field of extreme ultraviolet (EUV) light sources, holding 2 patents that showcase his innovative approach to technology.
Latest Patents
Schlosser's latest patents include an EUV light source with a beam positioning device and an EUV light source with a separation device. The first patent describes an extreme ultraviolet light source that features a providing device for target material, a pulsed laser source, and a beam guidance device. This setup allows for focused irradiation of the target material, which emits EUV radiation due to the pulsed laser beam. The beam guidance device is equipped with a beam positioning device that consists of four mirrors, enabling precise control over the pulsed laser beam's direction.
The second patent outlines an EUV light source that incorporates a prepulse laser source and a main pulse laser source. This invention allows for the irradiation of target material with both a prepulse and a main pulse, resulting in the emission of EUV radiation. The prepulse beam guiding device includes a separation device that effectively reflects unwanted radiation, ensuring optimal performance of the light source.
Career Highlights
Throughout his career, Oliver Schlosser has worked with notable companies, including Trumpf Lasersystems for Semiconductor Manufacturing GmbH and Trumpf Lasersystems for Semiconductor Manufacturing SE. His experience in these organizations has contributed to his expertise in laser technology and semiconductor manufacturing.
Collaborations
Schlosser has collaborated with talented individuals in his field, including colleagues Stefan Piehler and Martin Lambert. Their combined efforts have further advanced the development of EUV light source technologies.
Conclusion
Oliver Schlosser's innovative work in the field of EUV light sources has led to significant advancements in technology. His patents reflect a deep understanding of laser systems and their applications in semiconductor manufacturing.