Company Filing History:
Years Active: 2019
Title: The Innovations of Oktawian Sobieraj
Introduction
Oktawian Sobieraj is an accomplished inventor based in Ballston Lake, NY (US). He has made significant contributions to the field of optical technology, particularly in the area of extreme ultraviolet (EUV) lithography. His innovative work has led to the development of a unique patent that enhances the efficiency of optical masks used in semiconductor manufacturing.
Latest Patents
Oktawian Sobieraj holds a patent for "Pellicle replacement in EUV mask flow." This invention involves an optical mask with a first pellicle attached. The optical mask is inspected with the first pellicle in place using first wavelengths of electromagnetic radiation. The first pellicle is then replaced with a second pellicle, which allows shorter wavelengths to pass. This process enables the exposure of photoresist using the optical mask with the second pellicle in place, followed by a re-inspection of the optical mask with the first pellicle.
Career Highlights
Oktawian Sobieraj is currently employed at Globalfoundries Inc., where he continues to push the boundaries of innovation in semiconductor technology. His work has been instrumental in improving the processes involved in EUV lithography, which is crucial for the advancement of microelectronics.
Collaborations
Throughout his career, Oktawian has collaborated with notable colleagues, including Paul Willard Ackmann and SherJang Singh. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.
Conclusion
Oktawian Sobieraj's contributions to the field of optical technology and his innovative patent demonstrate his commitment to advancing semiconductor manufacturing processes. His work continues to influence the industry and pave the way for future innovations.