Location History:
- Kfar-Kama, IL (2017)
- Kfar HaHoresh, IL (2020)
Company Filing History:
Years Active: 2017-2020
Title: Oded Stein: Innovator in Medical Device Technology
Introduction
Oded Stein is a notable inventor based in Kfar Hahoresh, Israel, recognized for his contributions to medical device technology. With a total of two patents to his name, Stein has made significant advancements in the field of stent manufacturing and negative pressure wound therapy.
Latest Patents
Stein's latest patents include a "Systems and method for stent manufacturing using protective shields." This invention involves a stent manufacturing assembly that incorporates an inner shield, a patterned metal sheet, and an outer shield. The patterned metal sheet features a polymer coating embedded with a therapeutic agent. The assembly is designed to be rolled into a tubular shape and welded to create a functional stent. Another significant patent is the "Connection device for use in the negative pressure treatment of wounds." This device consists of a flexible conduit with multiple lumens, designed to facilitate negative pressure therapy. The conduit is equipped with a coupling body made from elastomeric material, ensuring a tight seal against the atmosphere while communicating with the wound space.
Career Highlights
Throughout his career, Oded Stein has worked with reputable companies such as Paul Hartmann AG and Medinol Ltd. His experience in these organizations has contributed to his expertise in medical device innovation and development.
Collaborations
Stein has collaborated with notable professionals in the field, including Axel Eckstein and Pierre Croizat. These partnerships have likely enhanced his work and contributed to the success of his inventions.
Conclusion
Oded Stein's innovative work in medical device technology, particularly in stent manufacturing and wound therapy, showcases his commitment to improving healthcare solutions. His patents reflect a deep understanding of the complexities involved in medical device design and functionality.