Company Filing History:
Years Active: 2023-2024
Title: O Byoung Kwon: Innovator in Display Technology
Introduction
O Byoung Kwon is a distinguished inventor based in Jeonju-si, South Korea. He has made significant contributions to the field of display technology, particularly through his patented innovations. With two patents to his name, his work focuses on enhancing the efficacy of thin films in display devices.
Latest Patents
Among his latest patents, O Byoung Kwon has developed an etching composition for thin films containing silver, alongside a method for forming a pattern and a process for manufacturing a display device. This etching composition includes an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water. His innovative methods aim to improve the performance and manufacturability of display devices through advanced etching techniques.
Career Highlights
O Byoung Kwon is currently affiliated with Samsung Display Co., Ltd., a leading company in the display industry. His expertise in etching compositions and manufacturing methods has positioned him as a valuable asset within the organization. His dedication to research and innovation has led to successful advancements in display technology.
Collaborations
O Byoung Kwon collaborates with notable coworkers, including Hyoung Sik Kim and Kyungchan Min. Together, they work on various projects within Samsung Display, pooling their talents and expertise to drive forward the development of cutting-edge display technologies.
Conclusion
Through his innovative spirit and dedication to advancing display technologies, O Byoung Kwon continues to make impactful contributions to the field. His patents not only showcase his technical acumen but also highlight the importance of collaboration in fostering advancements that benefit the broader industry. As he progresses in his career, his work will undoubtedly lead to further innovations that enhance the performance of display devices.