Chesaning, MI, United States of America

Norman H Deitering


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Norman H Deitering: Innovator in Tetrachlorosilane Purification

Introduction

Norman H Deitering is a notable inventor hailing from Chesaning, Michigan. He has made a significant contribution to the field of semiconductor manufacturing through his innovative methods aimed at the purification of tetrachlorosilane. With a focus on reducing impurities, specifically phosphorus, in this crucial material, Deitering's work is pivotal for the electronics industry.

Latest Patents

Deitering holds a patent for his method titled "Phosphorous removal from tetrachlorosilane." This invention outlines a technique that effectively purifies tetrachlorosilane, which is essential for the production of electronic-grade silicon. The method involves contacting liquid tetrachlorosilane with activated charcoal, enabling the reduction of phosphorus levels to parts per trillion. The process is designed for flexibility, allowing it to be executed as either a continuous or batch process, facilitating easy separation of the phosphorus-contaminated activated charcoal.

Career Highlights

Deitering’s career has been marked by his association with Hemlock Semiconductor Corporation, a leading player in the silicon market. His role involves significant advancements in the purification processes critical for supplying high-quality materials to the semiconductor industry.

Collaborations

Throughout his career, Norman has collaborated with industry professionals like Robert G Brink and Michael H Greene, pooling together expertise and insights that enhance innovation and drive progress in semiconductor technologies. These partnerships have played a crucial role in advancing the manufacturing capabilities and ensuring the delivery of top-tier electronic components.

Conclusion

Norman H Deitering stands out as a significant figure in the realm of semiconductor manufacturing through his innovative purification techniques for tetrachlorosilane. His patent represents a vital advancement for the industry, highlighting the necessity of reducing impurities to maintain the integrity of electronic components. As technology continues to evolve, inventions like those of Deitering will remain at the forefront of ensuring quality and efficiency in semiconductor production.

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