Norman E Reitz

Title: The Innovations of Norman E. Reitz

Introduction

Norman E. Reitz is a notable inventor based in Redwood City, California. He has made significant contributions to the field of materials science, particularly in the development of crystalline films and heteroepitaxy techniques. With a total of four patents to his name, Reitz has demonstrated a commitment to advancing technology through innovative solutions.

Latest Patents

One of his latest patents is titled "Layer of crystalline silicon having (111) orientation on (111) surface - Low strain heteroepitaxy of (111) silicon on (111) lithium aluminum." This invention focuses on the intricate relationship between silicon and lithium aluminum, detailing how a 7.times.7 reconstructed (111) silicon surface can effectively match a 6.times.6 array of aluminum atoms. The precision of this alignment is crucial for minimizing strain in the material.

Another significant patent is the "Method for forming a crystalline film for a paramagnetic sodium thallium." This invention describes a process for creating a crystalline dual diamond sodium thallium type intermetallic compound on a substrate surface. The compound is formed in a magnetic field, ensuring that its major crystallographic plane aligns parallel to the field. This innovative approach allows for the potential growth of silicon on the compound's surface.

Career Highlights

Throughout his career, Norman E. Reitz has worked with various companies, including Sotec Corporation and Sotek Corporation. His experience in these organizations has contributed to his expertise in materials science and patent development.

Collaborations

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Conclusion

Norman E. Reitz's contributions to the field of materials science through his patents reflect his innovative spirit and dedication to advancing technology. His work continues to influence the development of new materials and processes in the industry.