Noritsugu Yoshizawa

Title: Noritsugu Yoshizawa: Innovator in Lithography Technology

Introduction

Noritsugu Yoshizawa is a prominent inventor based in Saitama, Japan. He is known for his contributions to the field of lithography, particularly in optimizing process conditions through innovative methods. His work has significant implications for the semiconductor industry and related technologies.

Latest Patents

Yoshizawa holds a patent titled "Method of lithography utilizing orthogonal experiment to improve profile." This patent describes a method of lithography that simplifies and enhances the optimization of process conditions based on a limited number of experiments. The method focuses on obtaining a line edge roughness of a resist pattern as a key evaluation metric. By employing an orthogonal experiment based on a structured table of significant factors, the process conditions can be defined more precisely. The patent emphasizes the selection of appropriate reference level values that minimize edge roughness, thereby improving the reproducibility and sensitivity of the lithography process.

Career Highlights

Yoshizawa is currently associated with Sony Corporation, where he applies his expertise in lithography to advance the company's technological capabilities. His innovative approach has contributed to the development of more efficient manufacturing processes in the electronics sector.

Collaborations

Yoshizawa has collaborated with notable colleagues, including Masaki Yoshizawa and Shigeru Moriya. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the innovation process.

Conclusion

Noritsugu Yoshizawa's work in lithography exemplifies the impact of innovative thinking in technology. His patent and contributions to Sony Corporation highlight the importance of optimizing manufacturing processes in the semiconductor industry. His efforts continue to shape advancements in lithography and related fields.