Company Filing History:
Years Active: 1993
Title: Noritoshi Sugawara: Innovator in Multilayer Structures
Introduction
Noritoshi Sugawara is a prominent inventor based in Kanagawa, Japan. He is known for his innovative contributions to the field of multilayer structures, particularly in the fabrication methods that enhance reliability and performance.
Latest Patents
Sugawara holds a patent for a multilayer structure and its fabrication method. This invention involves a process where a first electrically conductive layer is patterned on an insulative substrate. A polyamic acid resin layer is then coated over this conductive layer. A metal pin is pierced into the resin layer, allowing for a cold-welded connection to the first conductive layer. The method ensures improved flatness of each layer, enabling a larger number of multilayers without the issues of pattern breakage. The use of polyimide resin, which matches the thermal expansion coefficient of the pin, further enhances the reliability of the connections.
Career Highlights
Sugawara is associated with Fujitsu Corporation, where he has made significant contributions to research and development in multilayer structures. His work has been instrumental in advancing technologies that require high reliability and performance.
Collaborations
One of his notable collaborators is Kazuaki Satoh, with whom he has worked on various projects related to multilayer structures.
Conclusion
Noritoshi Sugawara's innovative work in multilayer structures has paved the way for advancements in technology that require reliable connections and improved performance. His contributions continue to influence the field significantly.