Noriko Kishikawa

Title: Noriko Kishikawa: Innovator in Antifogging Technology

Introduction

Noriko Kishikawa is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of antifogging technology, holding a total of 2 patents. Her innovative work focuses on creating articles that enhance visibility and performance in various applications.

Latest Patents

Kishikawa's latest patents include an antifogging article and method for manufacturing the same, as well as a water-absorbing layer forming composition. The antifogging article features a substrate with an antifogging film that excels in durability and appearance. This film includes a water-absorbing layer made from a material with a saturated water absorption amount of 50 mg/cm or more. The composition used in the antifogging film consists of a first cured epoxy resin derived from a polyepoxide component, a polyaddition type curing agent, and a catalyst type curing agent. Additionally, her work on the article for transportation apparatus incorporates the antifogging article, ensuring enhanced visibility in various conditions.

Career Highlights

Throughout her career, Kishikawa has worked with notable companies such as Asahi Glass Company, Limited and AGC Inc. Her experience in these organizations has allowed her to develop and refine her innovative ideas in antifogging technology.

Collaborations

Kishikawa has collaborated with talented individuals in her field, including Takashige Yoneda and Yusuke Mori. These partnerships have contributed to her success and the advancement of her inventions.

Conclusion

Noriko Kishikawa is a trailblazer in antifogging technology, with her patents reflecting her commitment to innovation and excellence. Her work continues to impact various industries, enhancing safety and performance through her inventive solutions.