Company Filing History:
Years Active: 2001-2006
Title: Norihisa Asano: Innovator in Semiconductor Technology
Introduction
Norihisa Asano is a prominent inventor based in Fukuoka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.
Latest Patents
Asano's latest patents include innovative designs that improve semiconductor functionality. One of his patents is for a semiconductor device having a sealing structure for wide gap type semiconductor chips. This invention encapsulates a semiconductor chip and its corresponding external electrode terminals with a glass-based sealing material. The semiconductor chip features a wide gap semiconductor element, with electrodes connected to the external terminals using a silver-based brazing member and/or pressure contact. Another notable patent is for a semiconductor wafer and semiconductor device that incorporates multiple chips. This design includes a plurality of dicing lines extending in both lateral and longitudinal directions, with varying widths to optimize the semiconductor element forming region.
Career Highlights
Norihisa Asano is currently employed at Mitsubishi Denki Kabushiki Kaisha, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced semiconductor devices that meet the demands of modern electronics.
Collaborations
Asano collaborates with talented individuals in his field, including Youichi Ishimura and Hideki Takahashi. These partnerships enhance the innovation process and contribute to the success of their projects.
Conclusion
Norihisa Asano is a key figure in the semiconductor industry, with a focus on innovative designs that improve device performance. His contributions through patents and collaborations highlight his commitment to advancing technology in this critical field.