Toyama, Japan

Norihiro Yamashima

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):Explore Patents

Title: Norihiro Yamashima: Innovator in Substrate Processing Technology

Introduction

Norihiro Yamashima is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of substrate processing technology, holding three patents to his name. His work primarily focuses on enhancing the efficiency and functionality of semiconductor manufacturing processes.

Latest Patents

Yamashima's latest patents include a substrate processing apparatus and a furnace opening closer. The substrate processing apparatus features a reaction chamber designed for substrate processing, equipped with a lid that closes the furnace opening. This innovative design includes a base beneath the lid and a connector that links the lid and base. The connector comprises a shaft at the lid, an elastic structure surrounding the shaft, and a cap at the base, ensuring a secure and efficient operation. Another patent details a method of manufacturing semiconductor devices, which includes a first processing module and a first utility system that supplies processing gas into the process container. This system is designed to optimize the exhaust process, enhancing the overall efficiency of semiconductor manufacturing.

Career Highlights

Yamashima is currently employed at Kokusai Electric Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in substrate processing has positioned him as a key player in advancing manufacturing techniques.

Collaborations

Throughout his career, Yamashima has collaborated with notable colleagues, including Daigi Kamimura and Tomoshi Taniyama. These partnerships have fostered innovation and contributed to the successful development of new technologies in their field.

Conclusion

Norihiro Yamashima's contributions to substrate processing technology exemplify his dedication to innovation in the semiconductor industry. His patents reflect a commitment to improving manufacturing processes, making him a significant figure in his field.

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