Tokyo-To, Japan

Norihiro Tarumoto


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 34(Granted Patents)


Location History:

  • Tokyo-To, JP (1996)
  • Tokyo, JP (1997)

Company Filing History:


Years Active: 1996-1997

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2 patents (USPTO):Explore Patents

Title: Norihiro Tarumoto: Innovator in Phase Shift Photomask Technology

Introduction

Norihiro Tarumoto is a prominent inventor based in Tokyo-To, Japan. He has made significant contributions to the field of photomask technology, particularly in the development of phase shift photomasks. With a total of 2 patents to his name, Tarumoto's work has had a substantial impact on the industry.

Latest Patents

Tarumoto's latest patents include innovations related to phase shift photomasks and their production processes. One of his notable inventions is a phase shift photomask in which the peripheral region portion of a phase shift layer is removed through a relatively simple procedure. This invention ensures that the photomask has minimal defects and is cost-effective. The process involves forming a phase shift layer over a transparent substrate and selectively etching the peripheral region, thereby confining the phase shift layer within a smaller area. Another significant patent describes a method for producing a phase shift photomask, where a transparent film is coated onto a substrate and selectively irradiated to form a phase shifter pattern. This method reduces the number of defective photomasks by preventing dust formation in the peripheral area.

Career Highlights

Norihiro Tarumoto is associated with Dai Nippon Printing Co., Ltd., where he has been instrumental in advancing photomask technology. His innovative approaches have contributed to the efficiency and reliability of photomasks used in various applications.

Collaborations

Throughout his career, Tarumoto has collaborated with notable colleagues, including Hiroyuki Miyashita and Yukio Iimura. These collaborations have further enhanced the development of cutting-edge technologies in the field.

Conclusion

Norihiro Tarumoto's contributions to phase shift photomask technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving manufacturing processes and reducing defects, making a lasting impact on the industry.

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