Nohong Kwak

Title: Nohong Kwak: Innovator in SEM Technology

Introduction

Nohong Kwak is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of scanning electron microscopy (SEM) through his innovative patents. With a total of 2 patents, his work focuses on enhancing the accuracy and efficiency of SEM equipment.

Latest Patents

Kwak's latest patents include a "Method of Detecting Measurement Error of SEM Equipment" and a "Pattern Inspection Method Using Pattern Model." The first patent provides a method for accurately detecting measurement errors in SEM equipment by comparing design images with SEM images. This involves acquiring SEM images, performing pre-processing, selecting training images, and generating a conversion model to determine measurement errors based on alignment coordinate values. The second patent outlines a pattern inspection method that converts sample patterns into training images, extracts feature values, and clusters Gaussian vectors to create a pattern model for inspecting target patterns.

Career Highlights

Throughout his career, Nohong Kwak has worked with notable organizations such as Samsung Electronics and Seoul National University. His experience in these institutions has allowed him to develop and refine his innovative techniques in SEM technology.

Collaborations

Kwak has collaborated with talented individuals, including Donyun Kim and Kihyun Kim, who have contributed to his research and development efforts.

Conclusion

Nohong Kwak's contributions to SEM technology through his patents demonstrate his commitment to innovation and excellence in the field. His work continues to influence advancements in measurement accuracy and pattern inspection methods.