Nobuyuki Nishimiya

Title: Nobuyuki Nishimiya: Innovator in Lithographic Printing Technology

Introduction

Nobuyuki Nishimiya is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of lithographic printing technology. With a total of 4 patents to his name, his work has had a lasting impact on the industry.

Latest Patents

Nishimiya's latest patents include innovative designs for photosensitive lithographic printing plates. One notable patent describes a photosensitive lithographic printing plate that comprises a substrate with a photosensitive layer formed by coating and drying a specific composition. This composition is prepared by hydrolyzing and polycondensing a compound in a solvent that contains a phenol or an organic phosphoric acid compound. Another patent focuses on a negative photosensitive lithographic printing plate that features an aluminum or organic polymer support. This support has a specific surface roughness and is designed to enhance the photopolymerization process.

Career Highlights

Nobuyuki Nishimiya is currently employed at Fuji Photo Film Company, Limited. His work at this esteemed company has allowed him to develop and refine his innovative ideas in lithographic printing technology. His contributions have been instrumental in advancing the capabilities of printing materials.

Collaborations

Throughout his career, Nishimiya has collaborated with notable colleagues, including Keiji Akiyama and Noriaki Watanabe. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Nobuyuki Nishimiya's work in lithographic printing technology exemplifies innovation and dedication. His patents and contributions continue to influence the industry, showcasing the importance of research and development in advancing technology.