Kanagawa, Japan

Nobuyuki Ishiguro

This inventor holds 1 USPTO granted patent. Top assignee: Mitsui Toatsu Chemicals, Incorporated. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyuki Ishiguro. Retrieved from https://idiyas.com/inventor/nobuyuki-ishiguro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 74(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: **Inventor Nobuyuki Ishiguro: Innovating in Microcrystalline Silicon Technology**

Introduction

Nobuyuki Ishiguro, a talented inventor based in Kanagawa-ken, Japan, has made significant contributions to the field of semiconductor technology. With a unique focus on microcrystalline silicon, he has developed innovative processes that enhance the efficiency of solar cells and other electronic devices.

Latest Patents

Ishiguro holds a patent for a "Process for forming a thin microcrystalline silicon semiconductor film." This invention outlines a method for creating a thin film that serves as an intrinsic semiconductor layer in applications such as amorphous silicon solar cells. The thin film consists of an amorphous phase containing prismatic or conical crystallite aggregates, with additional individual crystallites possibly dispersed throughout. The crystalline fraction of the film ranges from 5 to 80%, and the crystallite size can vary between 2 to 1,000 nm. The process involves initially forming a film with a thickness of 2 nm to 100 nm at a slow deposition rate, followed by the creation of a principal film at a higher rate, often utilizing RF plasma chemical vapor deposition (CVD).

Career Highlights

Nobuyuki Ishiguro's career is marked by his role at Mitsui Toatsu Chemicals, Incorporated, where he has been pivotal in advancing semiconductor technologies. His innovative approach to developing microcrystalline silicon films has paved the way for improved performance in solar cells, contributing to the growth of renewable energy technology.

Collaborations

Ishiguro has collaborated with notable colleagues such as Kimihiko Saitoh and Mitsuru Sadamoto. Together, they have worked on various projects that combine their expertise in semiconductor materials, facilitating advancements in research and practical applications.

Conclusion

Nobuyuki Ishiguro stands out as an influential figure in the realm of semiconductor innovation. His patented process for creating thin microcrystalline silicon films not only demonstrates his technical prowess but also underscores the importance of partnerships in the field of research and development. As the demand for efficient energy solutions continues to grow, Ishiguro's contributions will likely play a critical role in shaping the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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