Company Filing History:
2 out of 775 
1 out of 324 Years Active: 1983-1993
Title: Nobuyuki Futamura: Innovator in Photosensitive Resin Technology
Introduction
Nobuyuki Futamura is a notable inventor based in Maebashi, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 3 patents. His work has had a considerable impact on various applications, particularly in the development of color filters and transparent thin films.
Latest Patents
Futamura's latest patents include innovative advancements such as a photosensitive resin composition and a color filter comprising a polymer. Additionally, he has developed resin compositions and processes for forming transparent thin films. These inventions showcase his expertise and commitment to enhancing material properties in the industry.
Career Highlights
Throughout his career, Nobuyuki Futamura has worked with prominent companies, including Nippon Kayaku Co., Ltd. and Tanabe Seiyaku Company, Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the field of materials science.
Collaborations
Futamura has collaborated with esteemed colleagues, including Matsuo Hashimoto and Sumio Yoda. These partnerships have fostered a creative environment that has led to the development of innovative solutions in resin technology.
Conclusion
Nobuyuki Futamura's contributions to the field of photosensitive resin technology are noteworthy. His patents and collaborations reflect his dedication to innovation and excellence in material science.