Sagamihara, Japan

Nobutoshi Ebashi


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: The Innovations of Nobutoshi Ebashi: Pioneering Ashing Methods for Semiconductors

Introduction

Nobutoshi Ebashi, an accomplished inventor hailing from Sagamihara, Japan, has made significant contributions to the field of semiconductor technology. With a patent to his name, Ebashi has demonstrated his expertise in developing methods that enhance the efficiency and effectiveness of semiconductor processing.

Latest Patents

Ebashi's notable innovation is encapsulated in his patent titled "Method for Ashing a Photoresist Resin Film on a Semiconductor Wafer." The objective of this invention is to provide an ashing method and an asher designed to mitigate damage to semiconductor components during the ashing process of a photoresist resin film. This process typically employs active oxygen plasma and aims to reduce lengthy treatment times that occur with traditional low pressure mercury discharge lamp methods. The method involves placing a wafer with a photoresist resin film into an ozone-containing atmosphere, where activated oxygen is rapidly produced via the radiation light from a discharge lamp, effectively ashing the resin film.

Career Highlights

Nobutoshi Ebashi has worked with Ushio Denki Kabushiki Kaisha, a leading company in the advancement of technologies related to lighting and optics. His work there has been pivotal in enhancing semiconductor manufacturing processes, showcasing his dedication to innovation and improvement in technological applications.

Collaborations

Throughout his career, Ebashi has collaborated closely with esteemed colleagues such as Shinji Suzuki and Kyohei Seki. Their combined efforts have likely played a substantial role in developing cutting-edge solutions within the semiconductor industry, further illustrating the importance of teamwork in riving technological advancements.

Conclusion

Nobutoshi Ebashi's work, particularly in the method for ashing photoresist resin films, represents a significant step forward in semiconductor processing technologies. With his innovative approach and a focus on minimizing damage to sensitive components, Ebashi continues to influence the field and inspire future innovations that could change semiconductor manufacturing dynamics. His contributions underscore the importance of innovation in driving the industry forward.

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