Tokyo, Japan

Nobuo Ebina


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal1 out of 832,843 
Other
 patents

Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Nobuo Ebina - Innovator in Microporous Copper Technology

Nobuo Ebina is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of microporous copper films. His innovative work has led to advancements in printed circuit board technology.

Latest Patents

Nobuo Ebina holds a patent for a microporous copper film and an electroless copper plating solution for obtaining the same. This patent describes a printed circuit board that comprises a metal copper film featuring 10 to 10 micropores per square centimeter. The metal copper film is prepared by dipping a plating object into an electroless copper plating solution that includes a copper ion, a complexing agent, a hypophosphorus acid compound, a metallic catalyst for initiating the reductive reaction, and a compound containing an acetylenic bond.

Career Highlights

Throughout his career, Nobuo Ebina has focused on enhancing the efficiency and effectiveness of copper plating processes. His work has been instrumental in improving the quality and performance of printed circuit boards, which are essential components in modern electronic devices.

Collaborations

Nobuo has collaborated with notable colleagues, including Hideo Honma and Tomoyuki Fujinami. These partnerships have fostered innovation and have contributed to the advancement of technology in their field.

Conclusion

Nobuo Ebina's contributions to the field of microporous copper technology have made a lasting impact on the electronics industry. His innovative patent and collaborative efforts highlight his dedication to advancing materials science.

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