Company Filing History:
Years Active: 1990
Title: Nobuhiko Koto: Innovator in Nitrogen Trifluoride Purification
Introduction
Nobuhiko Koto is a notable inventor based in Yamaguchi, Japan. He has made significant contributions to the field of chemical engineering, particularly in the purification of gases used in semiconductor manufacturing.
Latest Patents
Koto holds a patent for a process for purifying nitrogen trifluoride gas. This invention is crucial as it relates to obtaining high purity nitrogen trifluoride gas, which is utilized as a dry etching agent for semiconductors and as a cleaning gas for CVD apparatus. The process specifically addresses the removal of oxygen difluoride, enhancing the quality of the nitrogen trifluoride gas. His patent details a method that involves removing hydrogen fluoride from a nitrogen trifluoride crude gas and then contacting it with an aqueous solution containing sodium thiosulfate, hydrogen iodide, or sodium sulfide. He has 1 patent to his name.
Career Highlights
Nobuhiko Koto is associated with Mitsui Toatsu Chemicals, Incorporated, where he applies his expertise in chemical processes. His work has been instrumental in advancing the efficiency and effectiveness of gas purification methods in the semiconductor industry.
Collaborations
Koto has collaborated with notable colleagues such as Toshihiko Nishitsuji and Naruyuki Iwanaga. Their combined efforts contribute to the innovative advancements in their field.
Conclusion
Nobuhiko Koto's work in the purification of nitrogen trifluoride gas exemplifies the importance of innovation in the semiconductor industry. His contributions continue to impact the efficiency of manufacturing processes, showcasing the vital role of inventors in technological advancement.